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【名词缩写】光刻名词缩写

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发表时间:2018-01-29 10:08

AFs: Assist Features

ANN: Artificial Neural Network

ASA: Adaptive Simulated Annealing

ASET: Association of Super-Advanced Electronics


BF: Best Focus

BPCM: Bending Point Counting Method 弯曲点计数法


CAE: Critical Area Extraction

CD: Critical Dimension

CHS: Candidate Hotspot

Co-Opt: Co-Optimization

CP: Character Projection

CP: Clear Mask

CPL: Character Projection Lithography

CRMS: Cluster Resource Management Systems

CTR: Constant Threshold 恒定阈值


DFM: Design For Manufacturability

DFY: Design For Yield

DLS: Dense Line and Space

DoE: Design of Experiments

DRC: Design Rule Check


E2E: Line-end to Line-end

EB: Electron Beam

EBDW: Electron Beam Direct-Write

EUV: Extreme Ultraviolet Wavelength


FED: Focus-Exposure Data

FFS: Freeform Source

FMO: Flexible Mask Optimization

FPN: Fountain Pen Nanolithography

FW: FlexWave


GSS: Geometrical Sensitivity Space


HS: Hotspot

HWT: Hardware Tachyon


ILS: Image Log Slope

ILT: Inverse Lithography Technique

iOPC: Inverse OPC

IPs: Image Parameters

ISO: Isolated


LER: Line-edge Roughness

LFL: Litho-Friendly Layout

LMVS: Local Multi-variable Solver

LSF: Load Sharing Facility

LVS: Layout vs Schematic


Mask D2I: the Mask Design, Drawing, and Inspection Technology Research Department

MB-SRAF: Model based SRAF

MDP: Mask Data Preparation

MDR: Mask Data Rank


NA: Numerical Aperture

NEDO: New Energy and Industrial Technology Development Organization

NFS: Network File System

NILS: Normalized Image Log Slope


OCR: Optical Rule Checking

OMOG: Opaque Mo-Si on Glass

OPW: Overlapping Process Window

ORC: Optical Rule Checker


PAG: Photon-acid Generator

PC-SMO: Phase Control SMO

PCA: Principal Component Analysis 主成分分析

PDK: Process Definition Kit

PLIB: Pattern Library

PM: Pattern Matching

POI: Patterns OF Interest

POR: Process of Record

PPE: Pattern Placement Error

PRO: Pattern Recognition and Optimization

PSD: Process Space Decomposition

PTD: Positive Tone Development

PVBs: Process Variation Bands

PWC : Process Window Centering

PWE : Process Window Enhancement

PWQ : Process Window Qualification


RB-SRAF: Rule-based SRAF

RMS: Root Mean Square 均方根

ROC: Receiver Operating Characteristics

RTS: Real Time Simulator


SEM: Scanning Electron Microscope

SEPE: Stochastic Edge Placement Error

SGE: Sun Grid Engine

SGM: Sbar Guidance Map

SRAF: Sub-Resolution Assist Feature (Scattering Bar, or SBar )

SRM: Stochasti0c Resist Model

SVD: Singular Value Decomposition 奇异值分解

SVN: Support Vector Machine

SVS: Single Variable Solver


TAT: Turn Around Time

TCC: Transmission Cross-correlation

TCCs: Transmission Cross Coefficients

TFlex: Tachyon Flex

TNP: Light transmission & phase shift

TPG: Test Pattern Generator


VSB: Variable Shape Beam

VT: Variable Threshold