【名词缩写】光刻名词缩写2324
发表时间:2018-01-29 10:08 AFs: Assist Features ANN: Artificial Neural Network ASA: Adaptive Simulated Annealing ASET: Association of Super-Advanced Electronics BF: Best Focus BPCM: Bending Point Counting Method 弯曲点计数法 CAE: Critical Area Extraction CD: Critical Dimension CHS: Candidate Hotspot Co-Opt: Co-Optimization CP: Character Projection CP: Clear Mask CPL: Character Projection Lithography CRMS: Cluster Resource Management Systems CTR: Constant Threshold 恒定阈值 DFM: Design For Manufacturability DFY: Design For Yield DLS: Dense Line and Space DoE: Design of Experiments DRC: Design Rule Check E2E: Line-end to Line-end EB: Electron Beam EBDW: Electron Beam Direct-Write EUV: Extreme Ultraviolet Wavelength FED: Focus-Exposure Data FFS: Freeform Source FMO: Flexible Mask Optimization FPN: Fountain Pen Nanolithography FW: FlexWave GSS: Geometrical Sensitivity Space HS: Hotspot HWT: Hardware Tachyon ILS: Image Log Slope ILT: Inverse Lithography Technique iOPC: Inverse OPC IPs: Image Parameters ISO: Isolated LER: Line-edge Roughness LFL: Litho-Friendly Layout LMVS: Local Multi-variable Solver LSF: Load Sharing Facility LVS: Layout vs Schematic Mask D2I: the Mask Design, Drawing, and Inspection Technology Research Department MB-SRAF: Model based SRAF MDP: Mask Data Preparation MDR: Mask Data Rank NA: Numerical Aperture NEDO: New Energy and Industrial Technology Development Organization NFS: Network File System NILS: Normalized Image Log Slope OCR: Optical Rule Checking OMOG: Opaque Mo-Si on Glass OPW: Overlapping Process Window ORC: Optical Rule Checker PAG: Photon-acid Generator PC-SMO: Phase Control SMO PCA: Principal Component Analysis 主成分分析 PDK: Process Definition Kit PLIB: Pattern Library PM: Pattern Matching POI: Patterns OF Interest POR: Process of Record PPE: Pattern Placement Error PRO: Pattern Recognition and Optimization PSD: Process Space Decomposition PTD: Positive Tone Development PVBs: Process Variation Bands PWC : Process Window Centering PWE : Process Window Enhancement PWQ : Process Window Qualification RB-SRAF: Rule-based SRAF RMS: Root Mean Square 均方根 ROC: Receiver Operating Characteristics RTS: Real Time Simulator SEM: Scanning Electron Microscope SEPE: Stochastic Edge Placement Error SGE: Sun Grid Engine SGM: Sbar Guidance Map SRAF: Sub-Resolution Assist Feature (Scattering Bar, or SBar ) SRM: Stochasti0c Resist Model SVD: Singular Value Decomposition 奇异值分解 SVN: Support Vector Machine SVS: Single Variable Solver TAT: Turn Around Time TCC: Transmission Cross-correlation TCCs: Transmission Cross Coefficients TFlex: Tachyon Flex TNP: Light transmission & phase shift TPG: Test Pattern Generator VSB: Variable Shape Beam VT: Variable Threshold |